| TITLE "LVS Rule File for scn3me_subm" |
| |
| LVS POWER NAME vdd |
| LVS GROUND NAME gnd GROUND |
| LVS REDUCE PARALLEL MOS yes |
| LVS REDUCE SERIES MOS yes |
| LVS REDUCE SEMI SERIES MOS yes |
| LVS FILTER UNUSED MOS no |
| LVS RECOGNIZE GATES all |
| LVS COMPONENT TYPE PROPERTY element |
| LVS COMPONENT SUBTYPE PROPERTY model |
| LVS IGNORE PORTS no |
| |
| LVS REPORT mask.lvs.rep |
| LVS REPORT OPTION N |
| LVS REPORT MAXIMUM 50 |
| MASK RESULTS DATABASE maskdb |
| |
| precision 1000 |
| resolution 250 |
| |
| TEXT LAYER metal1 metal2 metal3 |
| PORT LAYER TEXT metal1 metal2 metal3 |
| |
| |
| layer pwell 41 |
| layer nwell 42 |
| layer active 43 |
| layer poly 46 |
| layer nimplant 45 |
| layer pimplant 44 |
| layer contact 25 |
| layer active_contact 48 |
| layer poly_contact 47 |
| layer metal1 49 |
| layer via1 50 |
| layer metal2 51 |
| layer via2 61 |
| layer metal3 62 |
| layer glass 52 |
| layer pad 26 |
| |
| connect metal1 metal2 by via1 |
| connect metal2 metal3 by via2 |
| |
| pdif = active and pimplant // P-diffusion |
| ndif = active and nimplant // N-diffusion |
| |
| ngate = poly and ndif // N-Transistor |
| pgate = poly and pdif // P-transistor |
| |
| nsrcdrn = ndif not ngate // N-tansistor Source and Drain contacts diffusion region |
| psrcdrn = pdif not pgate // P-tansistor Source and Drain contacts diffusion region |
| |
| pcont = psrcdrn and pwell |
| |
| ntapcont = active not interact pimplant |
| ptapcont = active not interact nimplant |
| |
| bulk = extent |
| nsub = (bulk not pwell) and nwell |
| ncont = nsrcdrn and nsub |
| |
| connect metal1 poly psrcdrn nsrcdrn by contact mask |
| connect psrcdrn pwell by pcont mask |
| connect nsrcdrn nsub by ncont mask |
| |
| ncont1= ntapcont and nsub |
| pcont1= ptapcont and pwell |
| connect metal1 ncont1 by contact mask |
| connect metal1 pcont1 by contact mask |
| connect ncont1 nsub |
| connect pcont1 pwell |
| |
| connect psrcdrn metal1 by contact |
| connect nsrcdrn metal1 by contact |
| |
| connect psrcdrn metal1 by active_contact |
| connect nsrcdrn metal1 by active_contact |
| |
| connect poly metal1 by contact |
| |
| connect poly metal1 by poly_contact |
| |
| device mp (p) pgate poly (G) psrcdrn (S) psrcdrn (D) nsub CMACRO FET_PROPERTIES pgate nsub |
| device mn (n) ngate poly (G) nsrcdrn (S) nsrcdrn (D) pwell CMACRO FET_PROPERTIES ngate pwell |
| |
| VARIABLE trace_delta 4e-9 |
| |
| DMACRO FET_TRACE device_type device_name { |
| TRACE PROPERTY device_type(device_name) l l trace_delta ABSOLUTE |
| TRACE PROPERTY device_type(device_name) w w trace_delta ABSOLUTE |
| |
| } |
| |
| CMACRO FET_TRACE MN n |
| CMACRO FET_TRACE MP p |
| |
| DMACRO FET_PROPERTIES seed well{ |
| [ |
| PROPERTY W, L, AS, AD, PS, PD |
| |
| AS = area(S) |
| AD = area(D) |
| PS = perimeter(S) |
| PD = perimeter(D) |
| if ( AS == 0 ) { |
| AD = area(D) / 2 |
| AS = AD |
| PD = perimeter(D) / 2 |
| PS = PD |
| } |
| if ( AD == 0 ) { |
| AS = area(S) / 2 |
| AD = AS |
| PS = perimeter(S) / 2 |
| PD = PS |
| } |
| W = (perim_co(seed,S) + perim_co(seed,D) ) * 0.5 |
| L = (perim(seed) - perim_co(seed,S) - perim_in(seed,S) - perim_co(seed,D) - perim_in(seed,D) ) * 0.5 |
| |
| ] |
| } |