| ########################### |
| Technology Specifications |
| ########################### |
| |
| .. |HfO2| replace:: |
| |
| HfO\ :sub:`2` |
| |
| ********* |
| FORMing |
| ********* |
| |
| The figure below shows forming data on a 1Mbit RRAM array. At fresh |
| (e.g., unformed) the starting conductance of the RRAM ranges below 0.1 |
| uS (e.g., resistance above 10MOhms). To form the cells, voltages from |
| 2.2 to 3.1V are required (average 2.5V), with very high yields (above |
| 99%) achieved with a max forming voltage of 3.1V. After FORM, the RRAMs |
| end up in an ultra-low LRS of 30-120uS. Resetting the cells after |
| forming results in an HRS. The forming pulse widths are 1,000ns (e.g., |
| 1us). |
| |
| .. image:: figures/reram_document_figures/forming.png |
| |
| The initial forming conditions impact the final resistance range |
| achievable with the RRAM cells. Using a higher forming voltage (and |
| longer forming pulses) result in an initial LRS state with a lower |
| resistance. Depending on the initial LRS resistance, the sharpness of |
| the SET/RESET transition and the window between the final LRS/HRS |
| changes as demonstrated in the figures below. This becomes critical when |
| determining the multiple bits per cell as a gradual SET/RESET procedure |
| is needed to fine tune the resistance. |
| |
| .. image:: figures/reram_document_figures/pulse_resistance_diagram.png |
| |
| Fig. 10 provides a possible explanation for the results in Figs.7-9. We |
| can divide the transition curve of conductance into 4 stages. During |
| FORMing, in Stage 0, a major filament with a wide radius is created in |
| |HfO2|. In addition, small filaments extend from the tip of the major |
| filament to the top electrode. During RESET, in Stage 1, the major |
| filament recesses resulting in abrupt drop in conductance. In Stage 2, |
| the small filaments slowly recess resulting in gradual reduction of |
| conductance. During SET, in Stage 3, the major filament reconnects and |
| the conductance jumps. In Stage 4, the small filaments re-connect and |
| the conductance slowly increases. |
| |
| .. figure:: figures/reram_document_figures/forming_pulse.png |
| |
| Figure extracted from [[1]_] |
| |
| ***************** |
| SETing/RESETing |
| ***************** |
| |
| The standard SET/RESET pulses used with the SkyWater RRAM |
| characteristics are summarized below for binary (e.g., 1-bit/cell) RRAM. |
| Note that these are dependent on the initial forming conditions used (as |
| discussed above). For completeness we give those conditions as well. |
| Where a range is given, the procedure is as follows: first fix the BL |
| voltage (for FORM/SET, SL voltage for RESET) and increase the WL pulse |
| amplitude by the step size given until the cell is successfully |
| formed/set/reset. If the cell is unsuccessful, then increase the BL |
| voltage by the step size, and so forth. |
| |
| The following tables were manually transcribed into this format the |
| original :download:`png |
| <figures/reram_document_figures/original_tables.png>` is is provided so |
| that others may check the transcription. |
| |
| .. csv-table:: 1T1R #5 |
| :file: figures/reram_document_figures/1T1R_5.csv |
| :header-rows: 1 |
| :align: center |
| |
| .. csv-table:: 1T4R #4 |
| :file: figures/reram_document_figures/1T4R_4.csv |
| :header-rows: 1 |
| :align: center |
| |
| .. csv-table:: 1T4R #9 |
| :file: figures/reram_document_figures/1T4R_9.csv |
| :header-rows: 1 |
| :align: center |
| |
| Alternative programming schemes can be used. For example, from our data |
| on the 1T4R test #9 above, one could consider using a fixed reset pulse |
| of WL=3V, SL=3V with a 1000ns pulse to ensure high RESET yields. |
| Additionally, a lower voltage can be tried multiple times (e.g., a |
| SET/READ and verify, or RESET/READ and verify) until the operation is |
| successful. The pulse length is also a free variable, shorter (e.g., |
| 100-200ns SET/RESET) pulses, with a verify scheme can also be used to |
| reduce average write time. |
| |
| ************************************************************** |
| Technology Specs: SkyWater 1T(n)R and Multiple Bits-Per-Cell |
| ************************************************************** |
| |
| 1T(n)R |
| ====== |
| |
| Multiple RRAM cells can be controlled with a single transistor. Such a |
| layout increases density, especially when integrated monolithically |
| (with multiple RRAM’s stacked above a single transistor). Below we give |
| schematics of such 1T4R and 1T8R arrays. |
| |
| .. image:: figures/reram_document_figures/1T4R_schematic.png |
| |
| .. image:: figures/reram_document_figures/1T8R_schematic.png |
| |
| FORMing 1T(n)R |
| ============== |
| |
| Such arrays require a different forming scheme. The operation of a 1T4R |
| RRAM array is much more complex (vs. a 1T1R array) since interactions |
| between multiple cells (in the same 1T4R structure) Fig. 4 presents our |
| forming approach for 1T4R RRAM array. The conventional approach for 1T1R |
| FORMs a cell (i.e., induces LRS in that cell) and then proceeds to the |
| next cell. However, if this conventional scheme is directly applied to |
| 1T4R (Fig. 4a), the FORMed cell, which is already in the low-resistance |
| state (LRS), will experience additional SET (over-SET) as another cell |
| inside the same 4R structure is being FORMed. After experiencing |
| multiple over-SETs, the resistance of a FROMed cell may fall to an |
| ultra-low value, and it may not be possible to RESET that cell anymore. |
| The FORMing scheme in Fig. 4b overcomes this challenge by RESETting a |
| cell (to the high-resistance state or HRS) immediately after it is |
| FORMed. Therefore, when a cell is being FORMed, the adjacent FROMed but |
| RESET cells (in the same 1T4R structure) are no longer over-SET. |
| Occasionally, an adjacent RESET cell may be SET accidentally. It is |
| necessary to check and RESET all cells in the 1T4R structure before the |
| next cell is FORMed. Using this strategy, the FORMing yield is 99%. The |
| forming voltages were given in the tables above. |
| |
| .. image:: figures/reram_document_figures/multirram_forming.png |
| |
| SETing/RESETing 1T(n)R |
| ====================== |
| |
| While the voltages of SET/RESET are given in the tables above, there are |
| additional considerations in writing a 1TnR cell. Multiple bits-per-cell |
| operation of 1T4R RRAM requires more precise control (vs. 1T1R) since |
| disturbances between adjacent cells (in the same 1T4R structure) will be |
| more serious. For example, Fig. 14 shows that when a cell in 1T4R is |
| selected to be SET, the other 3 (unselected) cells can experience a |
| small RESET, which can disturb the values stored in those (unselected) |
| cells. Therefore, additional compensating SET operations are needed to |
| restore the values in those (unselected) cells. By applying the |
| compensating SETs, the disturbances in the unselected cells can be well |
| alleviated, as shown in the insert of Fig. 14. The few low- voltage |
| compensating SET pulses do not affect the other cells. |
| |
| .. image:: figures/reram_document_figures/1T4R_forming_waveform.png |
| |
| Multiple Bits-Per-Cell: 1T1R with 2 or 3 Bits-Per-Cell |
| ====================================================== |
| |
| Programming |
| ----------- |
| |
| Multiple bits-per-cell programming requires fine control over the cell |
| resistance in order for the cells to end up in the desired range. There |
| are two techniques that have been explored on the SkyWater RRAM, the |
| first is demonstrated on a 1T1R structure and can achieve 2 or 3 |
| bits-percell. Adjusting VWL allows for “coarse” tuning of the RRAM |
| resistance (relatively large resistance change per pulse, but with less |
| accuracy), while VBL and VSL allow for “fine” tuning (relatively small |
| resistance change per pulse, but with more accuracy). Fig. 4 depicts the |
| “tuning curves” at 6kOhm (representative resistance for illustration) in |
| the SkyWater technology, which shows how the cell resistance (slope) is |
| more sensitive to changes in VWL than to changes in VBL (for SET) and |
| VSL (for RESET). A smaller slope signifies that the resistance can be |
| tuned more slowly/accurately and indicates that voltage noise has a |
| reduced impact on the change in resistance. We see that SET operations |
| allow for finer tuning than RESET operations, since the SET operation |
| results in an increasing voltage drop across the select transistor and a |
| decreasing voltage drop across the RRAM cell. |
| |
| .. _tuning_knob: |
| |
| .. figure:: figures/reram_document_figures/tuning_knob_v.png |
| |
| Tuning curves showing the sensitivity of resistance change to different |
| input knobs for a representative starting resistance of 6kΩ. Slopes |
| are measured at 5.5kΩ for SET and 6.5kΩ for RESET. During VSL RESET |
| tuning, VWL=3.5V; during VBL SET tuning, VWL=3V; for VWL |
| RESET tuning, VSL=2.8V; for VWL SET tuning, VBL=2V. Data is averaged |
| across 50 cells with 10 samples per cell. We also tested different |
| starting resistances and step sizes (not plotted for clarity). For all |
| parameters tested, the data showed that resistance change is more gradual when |
| tuning with VBL/VSL rather than VWL. |
| |
| ************ |
| References |
| ************ |
| |
| .. [1] |
| |
| E\. R\. Hsieh et al., "High-Density Multiple Bits-per-Cell 1T4R RRAM |
| Array with Gradual SET/RESET and its Effectiveness for Deep Learning," |
| 2019 IEEE International Electron Devices Meeting (IEDM), San Francisco, |
| CA, USA, 2019, pp. 35.6.1-35.6.4, doi: 10.1109/IEDM19573.2019.8993514. |