| Name,Description,Flags,Value,Unit |
| (m3.-),"| Algorithm should flag errors, for met3, if ANY of the following is true: |
| | An entire 700x700 window is covered by cmm3 waffleDrop, and metX PD < 70% for same window. |
| | 80-100% of 700x700 window is covered by cmm3 waffleDrop, and metX PD < 65% for same window. |
| | 60-80% of 700x700 window is covered by cmm3 waffleDrop, and metX PD < 60% for same window. |
| | 50-60% of 700x700 window is covered by cmm3 waffleDrop, and metX PD < 50% for same window. |
| | 40-50% of 700x700 window is covered by cmm3 waffleDrop, and metX PD < 40% for same window. |
| | 30-40% of 700x700 window is covered by cmm3 waffleDrop, and metX PD < 30% for same window. |
| | Exclude cells whose area is below 40Kum2. NOTE: Required for IP, Recommended for Chip-level.",RC,, |
| (m3.1),Width of metal 3,,0.300,µm |
| (m3.2),Spacing of metal 3 to metal 3,,0.300,µm |
| (m3.3a),Min. spacing of features attached to or extending from huge_met3 for a distance of up to 0.480 um to metal3 (rule not checked over non-huge met3 features),,N/A,N/A |
| (m3.3b),Min. spacing of huge_met3 to metal3 excluding features checked by m3.3a,,N/A,N/A |
| (m3.3c),Min. spacing of features attached to or extending from huge_met3 for a distance of up to 0.400 µm to metal3 (rule not checked over non-huge met3 features),,0.400,µm |
| (m3.3d),Min. spacing of huge_met3 to metal3 excluding features checked by m3.3a,,0.400,µm |
| (m3.4),Via2 must be enclosed by Met3 by at least …,AL,0.065,µm |
| (m3.5),Via2 must be enclosed by Met3 on one of two adjacent sides by at least …,,N/A,N/A |
| (m3.5a),Via2 must be enclosed by Met3 on all sides by at least …(Rule not checked on a layout when it satisfies both rules m3.4 and m3.5),,N/A,N/A |
| (m3.6),Min area of metal3,,0.240,µm² |
| (m3.7),Min area of metal3 holes,CU,0.200,µm² |
| (m3.pd.1),Min MM3_oxide_Pattern_density,RR,0.7,\- |
| (m3.pd.2a),Rule m3.pd.1 has to be checked by dividing the chip into square regions of width and length equal to …,A,700,µm |
| (m3.pd.2b),Rule m3.pd.1 has to be checked by dividing the chip into steps of …,A,70, |
| (m3.11),Max width of metal3,CU,4.000,µm |
| (m3.12),Add slots and remove vias and contacts if wider than…..,CU,3.200, |
| (m3.13),Max pattern density (PD) of metal3,CU,0.77,\- |
| (m3.14),Met3 PD window size,CU,50.000,µm |
| (m3.14a),Met3 PD window step,CU,25.000,µm |
| (m3.15),Via2 must be enclosed by met3 by at least…,CU,0.060,µm |
