| Material Thicknesses,,,Value (um),,Variable name |
| field oxide (above silicon surface) ... underneath poly,,,0.07,,FOXSTEP |
| "min. etch and fill capability for isolation, licon, and met1",,,0.15,,DEFC |
| min. etch and fill capability for mcon,,,0.14,,CEFC |
| min. etch and fill capability for via,,,0.18,,VEFC |
| poly cap after SPE,,,0.2,,OVGTTH |
| poly thickness,,,0.18,,POLYTH |
| oxide spacer ,,,0.05,,SpThickn |
| Pre-LI ILD thickness,,,0.5,,ILDTHICKN |
| Licon1 etch angle (deg),,,10,,LICETANG |
| Standard Licon bottom CD,,,0.08,,LBCD |
| Mcon enclosure by Li,,,0,,mconLiEnclosure |
| Via1 slope,,,0.02,,Via1Slope |
| Oxide Bias for MM1,,,0.6,,BiasMM1 |
| Oxide Bias for MM2,,,0.6,,BiasMM2 |
| Oxide Bias for MM3,,,1.15,,BiasMM3 |
| Oxide Bias for MM4,,,1.15,,BiasMM4 |
| LI1 thickness for antenna ratio calculations,,,0.1,,LiThick |
| Metal 1 thickness for antenna ratio calculations (S8D*),,,0.35,,Met1Thick |
| Metal 2 thickness for antenna ratio calculations (S8D*),,,0.35,,Met2Thick |
| Inductor thickness for antenna ratio calculation (S8D*),,,4,,IndmThick |
| Metal 3 thickness for antenna ratio calculation (S8Q/SP8Q),,,0.8,,Met3thick_q |
| Metal4 thickness for antenna ratio calculation (S8Q*/SP8Q),,,2,,Met4Thick_q |
| Metal 3 thickness for antenna ratio calculation (S8P*/SP8P*),,,0.8,,Met3thick_p |
| Metal4 thickness for antenna ratio calculation (S8P*/SP8P*),,,0.8,,Met4Thick_p |
| Metal5 thickness for antenna ratio calculation (S8P*/SP8P* with 2um thick metal),,,2,,Met5Thick_p |
| Metal5 thickness for antenna ratio calculation (S8P*/SP8P* with 1.2um thick metal),,,1.2,,Met5Thickp_12 |
| Metal 2 thickness for antenna ratio calculations (SP8T/S8T*),,,0.35,,Met2_Qthick |
| Metal 3 thickness for antenna ratio calculations (S8T* other than S8TM*),,,0.85,,Met3_Qthick |
| Metal 3 thickness for antenna ratio calculations (S8TM* flow),,,2,,Met3_TMthick |
| Metal 3 thickness for antenna ratio calculations (SP8T flow),,,0.8,,Met3_SP8Tthick |
| Photoresist thickness,,,1.14,,PRTHICKN |
| Photoresist thickness for HV Tip Implants,,,0.3,,PrThickImplant |
| Min width of tip implant opening,,,0.1,,minTip_impW |
| NTM shadowing,,,0.16,,ntmShadowing |
| HVNTM shadowing,,,0.232,,hvntmShadowing |
| HVPTM shadowing,,,0.089,,hvptmShadowing |
| pseudo-shadowing,,,0.045,,pseudoShadowing |
| Channel length for low Vt PMOS,,,0.35,,lvtpmos_poly |
| Width of the Low Leakage gate on each side of LowVt Pmos connected to power rails (requirement based on exp data),,,0.28,,LvtEnc_forPowerRail |
| CD tolerance for PDM (3s),,,1,,PdmCD_tol |
| Min process bias 3s tolerance,,,0.032,,PHTOL |
| Min process bias 3s tolerance for poly,,,0.02,,PHP1TOL |
| Minimum Space and Overlap,,,Value (um),,Variable name |
| Minimum mcon overlap onto LI for reproducible contact resistance,,,0.12,,TCONOVLP |
| Dogbone PR decay length (SRS 8/4/99),,,0.2,,DBPRDEC |
| Bowing of rectangular contact (per edge) -- seal ring sizing,,,0.015,,TBOWINGSEAL |
| Waffling / Pattern Density,,,Value,,Variable name |
| S8 average FOM PD (extractions from logic device),,,0.45,,FOMPDAVG |
| Size of small PD extraction box for rough tolerance (um),,,700,,SMALLPDBOX |
| Size of large PD extraction box for rough tolerance (um),,,2000,,LARGEPDBOX |
| Min pattern density for oxide,,,0.75,,OxideMinPD |
| Min MM* PD range,,,0.3,,MMPDrange |
| FOM 700um box PD tolerance for CMP (SOI8 PCR2) for all technologies,,,0.15,,FOM700TOL |
| Stepping box shift as a percent of box size,,,0.5,,BOXSHIFT |
| Maximum metal waffle drop pattern density in the frame,,,0.55,,PD_FrameWP |
| Window size for frame waffle drop PD check,,,100,,WP_PDWINDOW |
| Step size for frame waffle drop PD check,,,10,,WP_PDSTEP |
| Other,,,Value,,Variable name |
| Poly resistor width and spacing to reduce CD variation (um),,,0.33,,POLYRCD |
| Poly resistor width and spacing to reduce CD variation (um),,,0.48,,POLYRSPC |
| Spacing between slotted_licons (Not applicable when the two edges L= 0.19um),,,0.51,,LICM1SLSP1 |
| Precision resistor width to accommodate 6 contacts across,,,2.03,,PRECRESW |
| Li resistor width (to drop one Licon w/o dogbones),,,0.29,,LIRESCD |
| Correction factor for spacing to a wide metal line,,,2,,BIGMF |
| Min spacing for created dnwell to pnp.dg (more restrictive than dnwell.4 rule),,,5,,cdnwPnpSpc |
| "Min spacing between nwell and deep nwell on separate nets (Taken from dnwell.3 from S4* TDR *N plus rounded up, IGK request.)",,,6,,nwellDnwellSpc |
| Min space between deep nwells used as photo diode (um),,,5,,PDDnwSpc |
| Min space between dnwell (used for photo diode and other deep nwell (um),,,5.3,,PDDnwSpc1 |
| Min/Max width of nwell inside deep nwell (for photo diodes),,,0.84,,PDNwmCD |
| Min/Max enclosure of nwell by deep nwell (for photo diode),,,1.08,,PDNwmDnwEnc |
| Min/Max width of tap inside deep nwell (for photo diode),,,0.41,,PDTapCD |
| Min/Max enclosure of tap by nwell inside deep nwell (for photo diode),,,0.215,,PDTapNwmEnc |
