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RULE NO. ,DESCRIPTION ,LAYOUT RULE
Layer ,PP --- PPlus Implant,
PP.1 ,Min. PPlus Width ,0.40
PP.2 ,Min. PPlus space (Merge if the space is less than 0.4um), 0.40
PP.3a ,"Min. Pplus Space to NCOMP for NCOMP:
(1) Inside LVPWELL
(2) Outside NWELL and DNWELL","
0.16
0.16"
PP.3b ,"Min. Pplus Space to NCOMP: For Inside DNWELL:
(i) NCOMP space to LVPWELL ≥ 0.43μm
(ii) NCOMP space to LVPWELL<0.43μm","
0.08
0.16"
PP.3c ,"Min. Pplus Space to NCOMP: For Outside DNWELL:
(i) NWELL enclose NCOMP ≥ 0.43μm
(ii) NWELL enclose NCOMP <0.43μm","
0.08
0.16"
PP.3d ,Min/max Pplus overlap of Nplus ,0.00
PP.3e ,Min. Pplus Space to NCOMP edge adjacent to a butting edge ,0.00
PP.4a ,Min. Pplus Space related to N-channel gate at a butting edge parallel to gate ,0.32
PP.4b ,"Within 0.32μm of channel, space to N-channel gate extension perpendicular
to the direction of Poly2",0.22
PP.5a ,Min. PPlus extend beyond COMP under P-channel gate ,0.23
PP.5b ,"Extension beyond COMP for COMP :
(1) Inside NWELL
(2) Outside LVPWELL but inside DNWELL","
0.16
0.16"
PP.5c ,"Min. Pplus Extend beyond COMP: For Inside DNWELL:
(i) For LVPWELL enclose Pplus ≥ 0.43μm for LVPWELL tap
(ii) For LVPWELL enclose Pplus<0.43um for the LVPWELL tab","
0.02
0.16"
PP.5d ,"Min. Pplus Extend beyond COMP: For Outside DNWELL:
(i) For Pplus to NWELL space ≥ 0.43μm for Pfield tap
(ii) For Pplus to NWELL space < 0.43μm for Pfield tap","
0.02
0.16"
PP.6 ,Min. PCOMP extension beyond PCOMP/NCOMP butted edge ,0.22
PP.7 ,Min. Pplus Space to unsalicided Poly2 [Unrelated], 0.18
PP.8a ,Minimum PPlus area ,0.35 μm2
PP.8b ,Min. PPlus hole,0.35 μm2
PP.9 ,Min. PPlus enclose unsalicided Poly2 ,0.18
PP.10 ,Min. PPlus enclose unsalicided COMP ,0.18
PP.11 ,"Butting Pplus and NCOMP is forbidden within 0.43μm of Nwell edge (for
outside DNWELL) and of LVPWELL edge (for inside DNWELL case).",
PP.12 ,"Overlap with N-channel Poly2 gate extension is forbidden within 0.32μm of
N-channel gate",