| RULE NO. ,DESCRIPTION ,D/R,D/R |
| ,,LV,MV |
| Layer, NW=Nwell,, |
| NW.1a ,"Min Nwell width (This is only for litho purpose on the generated |
| area)",0.86 ,0.86 |
| NW.1b ,Min width if used as a resistor(outside DNWELL only) ,2.0 ,2.0 |
| NW.2a ,"Min. Nwell Space outside DNWELL [Same Potential] |
| Merge if the space is less (This rule is just applicable for Nwell |
| outside DNWELL)",0.6 ,0.74 |
| NW.2b ,"Min. Nwell Space outside DNWELL [Diff Potential] |
| (Note: By default all Nwells inside DNWELL will be at the same |
| potential.)",1.4 ,1.7 |
| NW.3 ,Min. Nwell to DNWELL space ,3.1 ,3.1 |
| NW.4 ,Min. Nwell to LVPWELL space ,0 ,0 |
| NW.5 ,Min. DNWELL enclose Nwell ,0.5 ,0.5 |
| NW.6 ,Nwell resistors can only exist outside DNWELL,, |
| NW.7 ,"If Nwell is used as resistor, it must be covered by RES_MK (for LVS |
| purpose). Width of the resistor determined by Nwell width. Length by |
| COMP to COMP space. RES_MK length shall be coincide with |
| resistor length (Touching COMP each side) and width covering the |
| width of Nwell)",, |
