| RULE NO.,DESCRIPTION,LAYOUT RULE |
| Layer,PPLUS --- Pplus Implant, |
| PP.1,Width,0.4 |
| PP.2,Space,0.4 |
| PP.3a,Space to NCOMP outside Nwell,0.16 |
| PP.3b,Space to NCOMP ≥ 0.43µm from Nwell edge (inside Nwell)0.08 |
| PP.3c,Space to NCOMP < 0.43µm from Nwell edge (inside Nwell),0.16 |
| PP.3d,Min/max space to a butted NCOMP,0 |
| PP.3e,Space to NCOMP edge adjacent to a butting edge,0 |
| PP.4a,Space related to N-channel gate at a butting edge parallel to gate,0.32 |
| PP.4b,Within 0.32µm of channel space to N-channel gate extension perpendicular to the direction of poly2,0.22 |
| PP.5a,Overlap of P-channel gate,0.23 |
| PP.5b,Extension beyond COMP inside Nwell,0.16 |
| PP.5c,Extension beyond COMP for PPLUS < 0.43µm from Nwell edge for Pwell tap,0.16 |
| PP.5d,Extension beyond COMP for PPLUS ≥ 0.43µm away from Nwell edge for Pwell tap,0.02 |
| PP.6,Overlap with PCOMP butted to NCOMP,0.22 |
| PP.7,Space to unrelated unsalicided Poly2,0.18 |
| PP.8a,Minimum PPlus area,0.35 μm2 |
| PP.8b,Minimum area enclosed by PPlus,0.35 μm2 |
| PP.9,Overlap of unsalicided Poly2,0.18 |
| PP.10,Overlap of unsalicided COMP,0.18 |
| PP.11,Butting PPLUS and NCOMP is forbidden within 0.43µm of well edge, |
| PP.12,Overlap with N-channel poly2 gate extension is forbidden within 0.32µm of N-channel gate, |
