| RULE NO.,DESCRIPTION,LAYOUT RULE |
| Layer,NPLUS --- NPLUS Implant, |
| NP.1,Width,0.4 |
| NP.2,Space,0.4 |
| NP.3a,Space to PCOMP inside Nwell,0.16 |
| NP.3b,Space to PCOMP ≥ 0.43µm from Nwell edge (outside Nwell),0.08 |
| NP.3c,Space to PCOMP < 0.43µm from Nwell edge (outside Nwell),0.16 |
| NP.3d,Min/max space to a butted PCOMP,0 |
| NP.3e,Space to related PCOMP edge adjacent to a butting edge,0 |
| NP.4a,Space to related P-channel gate at a butting edge parallel to gate,0.32 |
| NP.4b,"Within 0.32μm of channel, space to P-channel gate extension perpendicular to the direction of Poly2",0.22 |
| NP.5a,Overlap of N-channel gate,0.23 |
| NP.5b,Extension beyond COMP outside Nwell,0.16 |
| NP.5c,Extension beyond COMP for NPLUS < 0.43µm from Nwell edge for Nwell tap,0.16 |
| NP.5d,Extension beyond COMP for NPLUS ≥ 0.43µm away from Nwell edge for Nwell tap,0.02 |
| NP.6,Overlap with NCOMP butted to PCOMP,0.22 |
| NP.7,Space to unrelated unsalicided Poly2,0.18 |
| NP.8a,Minimum Nplus area,0.35 μm2 |
| NP.8b,Minimum area enclosed by Nplus,0.35 μm2 |
| NP.9,Overlap of unsalicided Poly2,0.18 |
| NP.10,Overlap of unsalicided COMP,0.18 |
| NP.11,Butting Nplus and PCOMP is forbidden within 0.43μm of Nwell edge, |
| NP.12,Overlap with P-channel poly2 gate extension is forbidden within 0.32μm of P-channel gate, |
