| RULE NO. ,DESCRIPTION ,LV/MV, HV Poly2 |
| PRES.1 ,Min. Poly2 resistor width ,0.8 ,0.8 |
| PRES.2 ,Min. Poly2 resistors space ,0.4 ,0.4 |
| PRES.3 ,Min. Poly2 resistor space to COMP ,0.6, 0.6 |
| PRES.4 ,Min. Poly2 resistor space to unrelated Poly2 ,0.6, 0.6 |
| PRES.5 ,Min. Pplus implant enclose Poly2 resistor ,0.3 ,0.3 |
| PRES.6 ,"Min. salicide block extend beyond Poly2 resistor in width |
| direction",0.3 ,0.3 |
| PRES.7 ,Min. Space from salicide block to contact on Poly2 resistor ,0.22 ,0.22 |
| G. PRES.8, Maximum current density of Poly2 resistor (mA/um) Guideline ,1.0 ,1.0 |
| PRES.9a ,"All High Voltage Poly2 resistors shall be covered by |
| “HVPOLYRS” Marking layer (to identify HV Poly2 resistors) |
| Min “HVPOLYRS” overlap of poly2.",--,0.0 |
| PRES.9b ,Minimum Poly2 to Guard-ring space,,0.7 |
| ,"All High voltage Poly2 resistors should be directly surrounded |
| by well or Substrate Guard-ring (for inside DNWELL, shall be |
| NCOMP guard ring, for outside DNWELL, shall be PCOMP |
| guard ring) and tied to the respective well or substrate potential.", |
| ,"Following layers are not allowed between Poly2 resistor & guard |
| ring: ((Nwell OR ndif) OUTSIDE DNWELL), gate, IND_MK |
| FuseTop, HVNDDD, HVPDDD", |
| PRES.10 ,"The total field (STI) area (X*Y) for Poly2 resistors should not be |
| larger than",-- ,15000um2 |
| ,"Note: However If the total area >15000um2 both sides of STI |
| field area should not be larger than (at least one side of this area |
| is smaller than the rule value for CMP dishing concern).",,80 |
| PRES.11 ,"Pplus Poly2 resistor shall be covered by RES_MK marking. |
| RES_MK length shall be coincide with resistor length (Defined |
| by SAB length) and width covering the width of Poly2.", |
| ,"If the size of single RES_MK mark layer is greater than |
| 15000um2 and both side (X and Y) are greater than 80um. then |
| the minimum spacing to adjacent RES_MK layer",20 ,20 |
