| 4.3 Mask Layer Numbering |
| =========================================== |
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| The following table matches the mask or reticle layer numbers to the drawn and generated layers |
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| .. csv-table:: Drawn layers |
| :file: tables_clear/4.3_mask_layer_numbering.csv |
| :widths: 100, 200, 400, 100, 100,100 |
| |
| |
| .. note:: |
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| 1. PIB data polarity is chrome for mask used in FAB2. PIB data polarity is clear for mask used in FAB6. |
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| 2. These layers are used for analog process. |
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| 3. These layers are reserved for future usage. |
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| 4. This layer L54 is used for Thin gate VT implant mask if thin gate native VT transistors are required (If Thin gate |
| Native VT NMOS is used then L61 cannot be used for VT implant as it is used for LDD). If thin gate native VT is not |
| required then L61 can be used both for VT and LDD implant. |
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| 5. Pad layer used both for bond pad and metal fuse open. |
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| 6. In case “Cu ball type wire bond” is used, the MetalTop or METAL_SHIELD should be Thick MetalTop Option |
| (section 7.16) or Thick METAL_SHIELD Option (section 7.22) respectively. |
| |
| 7. Layer LPN is for LVP VT implant when 4.2V Hybrid devices are used. |