| RULE NO.,DESCRIPTION,"LAYOUT |
| RULE" |
| EF.01,Min. (Poly2 butt PLFUSE) within EFUSE_MK and Pplus,0 |
| EF.02,Min. Max. PLFUSE width,0.18 |
| EF.03,Min. Max. PLFUSE length,1.26 |
| EF.04a,"Min. Max. PLFUSE overlap Poly2 (coinciding permitted) and |
| touch cathode and anode",0 |
| EF.04b,PLFUSE must be rectangular, |
| EF.04c,Cathode Poly2 must be rectangular, |
| EF.04d,Anode Poly2 must be rectangular, |
| EF.05,Min. Max. LVS_Source overlap Poly2 (at Anode),0 |
| EF.06,Min. Max. Cathode Poly2 width,2.26 |
| EF.07,Min. Max. Cathode Poly2 length,1.84 |
| EF.08,Min. Max. Anode Poly2 width,1.06 |
| EF.09,Min. Max. Anode Poly2 length,2.43 |
| EF.10,Min. Cathode Poly2 to Poly2 space,0.26 |
| EF.11,Min. Anode Poly2 to Poly2 space,0.26 |
| EF.12,Min. Space of Cathode Contact to PLFUSE end,0.155 |
| EF.13,Min. Space of Anode Contact to PLFUSE end,0.14 |
| EF.14,Min. EFUSE_MK enclose LVS_Source,0 |
| EF.15,NO Contact is allowed to touch PLFUSE, |
| EF.16a,Cathode must contain exact number of Contacts at each ends,4 |
| EF.16b,Anode must contain exact number of Contacts at each ends,4 |
| EF.17,Min. Space of EFUSE_MK to EFUSE_MK,0.26 |
| EF.18,"PLFUSE must sit on field oxide (NOT COMP), no cross with |
| any COMP, Nplus, ESD, SAB, Resistor, Metal1, Metal2", |
| EF.19,"Min. PLFUSE space to Metal1, Metal2",0 |
| EF.20,"Min. PLFUSE space to COMP, Nplus, ESD, SAB, Resistor",2.73 |
| EF.21,Min. Max. eFUSE Poly2 length,5.53 |
| EF.22a,"Min. Max. Cathode Poly2 overlap with PLFUSE in width Direction",1.04 |
| EF.22b,"Min. Max. Anode Poly2 overlap with PLFUSE in width Direction",0.44 |
