| RULE NO.,DESCRIPTION,Rule |
| HRES.1,"Minimum space |
| Note : Merge if the spacing is less than 0.40 um",0.4 |
| HRES.2,Minimum width of Poly2 resistor,1 |
| HRES.3,Minimum space between Poly2 resistors,0.4 |
| HRES.4,Minimum RESISTOR overlap of Poly2 resistor,0.4 |
| HRES.5,Minimum RESISTOR space to unrelated Poly2,0.3 |
| HRES.6,Minimum RESISTOR space to COMP,0.3 |
| HRES.7,Minimum Pplus overlap of contact on Poly2 resistor,0.2 |
| HRES.8,Space from salicide block to contact on Poly2 resistor,0.22 |
| HRES.9,Minimum salicide block overlap of Poly2 resistor in width direction,0.28 |
| HRES.10,Minimum & maximum Pplus overlap of SAB,0.1 |
| HRES.11*,Maximum current density of Poly2 resistor (mA/um),1 |
| HRES.12,"P type Poly2 resistor (high sheet rho) shall be covered by RES_MK |
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| marking. RES_MK length shall be coincide with resistor length (Defined |
| |
| by Pplus space) and width covering the width of Poly2. |
| |
| If the size of single RES_MK mark layer is greater than 15000um2 and |
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| both side (X and Y) are greater than 80um. Then the minimum spacing to |
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| adjacent RES_MK layer",20 |
