| RULE NO.,DESCRIPTION,Rule |
| PRES.1,Minimum width of Poly2 resistor,0.8 |
| PRES.2,Minimum space between Poly2 resistors,0.4 |
| PRES.3,Minimum space from Poly2 resistor to COMP,0.6 |
| PRES.4,Minimum space from Poly2 resistor to unrelated Poly2,0.6 |
| PRES.5,Minimum Plus implant overlap of Poly2 resistor,0.3 |
| PRES.6,Minimum salicide block overlap of Poly2 resistor in width direction,0.28 |
| PRES.7,Space from salicide block to contact on Poly2 resistor,0.22 |
| PRES.8*,Maximum current density of Poly2 resistor (mA/um),1 |
| PRES.9,"Pplus Poly2 resistor shall be covered by RES_MK marking. RES_MK |
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| length shall be coincide with resistor length (Defined by SAB length) |
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| and width covering the width of Poly2. |
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| If the size of single RES_MK mark layer is greater than 15000um2 and |
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| both side (X and Y) are greater than 80um. then the minimum spacing to |
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| adjacent RES_MK layer",20 |