| RULE NO.,DESCRIPTION,LAYOUT RULE | |
| Layer,NP = Nplus Implant, | |
| NP.1,Width,0.4 | |
| NP.2,Space,0.4 | |
| NP.3a,Space to PCOMP for PCOMP: (1) Inside Nwell (2) Outside LVPWELL but inside DNWELL,0.16 | |
| NP.3b,"Space to PCOMP: For Inside DNWELL, inside LVPWELL: | |
| I\) For PCOMP overlap by LVPWELL < 0.43μm | |
| II\) For PCOMP overlap by LVPWELL >= 0.43μm"," | |
| 0.16 | |
| 0.08" | |
| NP.3c,"Space to PCOMP: For Outside DNWELL: | |
| I\) For PCOMP space to Nwell < 0.43μm | |
| II\) For PCOMP space to Nwell >= 0.43μm"," | |
| 0.16 | |
| 0.08" | |
| NP.3d,Min/max space to a butted PCOMP,0 | |
| NP.3e,Space to related PCOMP edge adjacent to a butting edge,0 | |
| NP.4a,Space to related P-channel gate at a butting edge parallel to gate,0.32 | |
| NP.4b,"Within 0.32μm of channel, space to P-channel gate extension perpendicular to | |
| the direction of Poly2",0.22 | |
| NP.5a,Overlap of N-channel gate,0.23 | |
| NP.5b,Extension beyond COMP for the COMP (1) inside LVPWELL (2) outside Nwell and DNWELL,0.16 | |
| NP.5c,"Extension beyond COMP: For Inside DNWELL: | |
| I\) For Nplus < 0.43μm from LVPWELL edge for Nwell or DNWELL tap inside DNWELL | |
| II\) For Nplus >= 0.43μm from LVPWELL edge for Nwell or DNWELL tap inside DNWELL"," | |
| 0.16 | |
| 0.02" | |
| NP.5d,"Extension beyond COMP: For Outside DNWELL, inside Nwell: | |
| I\) For Nwell overlap of Nplus < 0.43μm | |
| II\) For Nwell overlap of Nplus >= 0.43μm"," | |
| 0.16 | |
| 0.02" | |
| NP.6,Overlap with NCOMP butted to PCOMP,0.22 | |
| NP.7,Space to unrelated unsalicided Poly2,0.18 | |
| NP.8a,Minimum Nplus area,0.35 μm2 | |
| NP.8b,Minimum area enclosed by Nplus,0.35 μm2 | |
| NP.9,Overlap of unsalicided Poly2,0.18 | |
| NP.10,Overlap of unsalicided COMP,0.18 | |
| NP.11,"Butting Nplus and PCOMP is forbidden within 0.43μm of Nwell edge | |
| (for outside DNWELL) and of LVPWELL edge (for inside DNWELL case).", | |
| NP.12,Overlap with P-channel poly2 gate extension is forbidden within 0.32μm of P-channel gate, |