| RULE NO.,DESCRIPTION,Rules |
| LRES.1,Minimum width of Poly2 resistor,0.8 |
| LRES.2,Minimum space between Poly2 resistors,0.4 |
| LRES.3,Minimum space from Poly2 resistor to COMP,0.6 |
| LRES.4,Minimum space from Poly2 resistor to unrelated Poly2,0.6 |
| LRES.5,Minimum Nplus implant overlap of Poly2 resistor,0.3 |
| LRES.6,Minimum salicide block overlap of Poly2 resistor in width direction,0.28 |
| LRES.7,Space from salicide block to contact on Poly2 resistor,0.22 |
| LRES.8*,Maximum current density of Poly2 resistor (mA/m),1 |
| LRES.9,"Nplus Poly2 resistor shall be covered by RES_MK marking. |
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| RES_MK length shall be coincide with resistor length (Defined by |
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| SAB length) and width covering the width of Poly2. |
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| If the size of single RES_MK mark layer is greater than 15000um2 |
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| and both side (X and Y) are greater than 80um. Then the minimum |
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| spacing to adjacent RES_MK layer",20 |
