tapeout/outputs/drc/caravel_1800eb3d_hres.lyrdb

<?xml version="1.0" encoding="utf-8"?>
<report-database>
 <description>DRC Run Report at</description>
 <original-file/>
 <generator>drc: script='/mnt/shuttles/shuttle/gfmpw-0/u6180_uchiyam/caravel_jacaranda-8_gf180/tapeout/outputs/drc/hres.drc'</generator>
 <top-cell>caravel_1800eb3d</top-cell>
 <tags>
 </tags>
 <categories>
  <category>
   <name>HRES.1</name>
   <description>HRES.1 : Minimum space. Note : Merge if the spacing is less than 0.4 um. : 0.4µm</description>
   <categories>
   </categories>
  </category>
  <category>
   <name>HRES.2</name>
   <description>HRES.2 : Minimum width of Poly2 resistor. : 1µm</description>
   <categories>
   </categories>
  </category>
  <category>
   <name>HRES.3</name>
   <description>HRES.3 : Minimum space between Poly2 resistors. : 0.4µm</description>
   <categories>
   </categories>
  </category>
  <category>
   <name>HRES.4</name>
   <description>HRES.4 : Minimum RESISTOR overlap of Poly2 resistor. : 0.4µm</description>
   <categories>
   </categories>
  </category>
  <category>
   <name>HRES.5</name>
   <description>HRES.5 : Minimum RESISTOR space to unrelated Poly2. : 0.3µm</description>
   <categories>
   </categories>
  </category>
  <category>
   <name>HRES.6</name>
   <description>HRES.6 : Minimum RESISTOR space to COMP.</description>
   <categories>
   </categories>
  </category>
  <category>
   <name>HRES.7</name>
   <description>HRES.7 : Minimum Pplus overlap of contact on Poly2 resistor. : 0.2µm</description>
   <categories>
   </categories>
  </category>
  <category>
   <name>HRES.8</name>
   <description>HRES.8 : Space from salicide block to contact on Poly2 resistor.</description>
   <categories>
   </categories>
  </category>
  <category>
   <name>HRES.9</name>
   <description>HRES.9 : Minimum salicide block overlap of Poly2 resistor in width direction.</description>
   <categories>
   </categories>
  </category>
  <category>
   <name>HRES.10</name>
   <description>HRES.10 : Minimum &amp; maximum Pplus overlap of SAB.</description>
   <categories>
   </categories>
  </category>
  <category>
   <name>HRES.12a</name>
   <description>HRES.12a : P type Poly2 resistor (high sheet rho) shall be covered by RES_MK marking. RES_MK length shall be coincide with resistor length (Defined by Pplus space) and width covering the width of Poly2. </description>
   <categories>
   </categories>
  </category>
  <category>
   <name>HRES.12b</name>
   <description>HRES.12b : If the size of single RES_MK mark layer is greater than 15000 um2 and both side (X and Y) are greater than 80 um. Then the minimum spacing to adjacent RES_MK layer. : 20µm</description>
   <categories>
   </categories>
  </category>
 </categories>
 <cells>
  <cell>
   <name>caravel_1800eb3d</name>
   <variant/>
   <references>
   </references>
  </cell>
 </cells>
 <items>
 </items>
</report-database>