tapeout/outputs/drc/caravel_18000abd_otp_mk.lyrdb

<?xml version="1.0" encoding="utf-8"?>
<report-database>
 <description>DRC Run Report at</description>
 <original-file/>
 <generator>drc: script='/mnt/shuttles/shuttle/gfmpw-0/u463_russellf/gf180_russell/tapeout/outputs/drc/otp_mk.drc'</generator>
 <top-cell>caravel_18000abd</top-cell>
 <tags>
 </tags>
 <categories>
  <category>
   <name>O.DF.3a</name>
   <description>O.DF.3a : Min. COMP Space. P-substrate tap (PCOMP outside NWELL) can be butted for different voltage devices as the potential is same. : 0.24µm</description>
   <categories>
   </categories>
  </category>
  <category>
   <name>O.DF.6</name>
   <description>O.DF.6 : Min. COMP extend beyond poly2 (it also means source/drain overhang). : 0.22µm</description>
   <categories>
   </categories>
  </category>
  <category>
   <name>O.DF.9</name>
   <description>O.DF.9 : Min. COMP area (um2). : 0.1444µm²</description>
   <categories>
   </categories>
  </category>
  <category>
   <name>O.PL.2</name>
   <description>O.PL.2 : Min. poly2 width. : 0.22µm</description>
   <categories>
   </categories>
  </category>
  <category>
   <name>O.PL.3a</name>
   <description>O.PL.3a : Min. poly2 Space on COMP. : 0.18µm</description>
   <categories>
   </categories>
  </category>
  <category>
   <name>O.PL.4</name>
   <description>O.PL.4 : Min. extension beyond COMP to form Poly2 end cap. : 0.14µm</description>
   <categories>
   </categories>
  </category>
  <category>
   <name>O.SB.2</name>
   <description>O.SB.2 : Min. salicide Block Space. : 0.28µm</description>
   <categories>
   </categories>
  </category>
  <category>
   <name>O.SB.3</name>
   <description>O.SB.3 : Min. space from salicide block to unrelated COMP. : 0.09µm</description>
   <categories>
   </categories>
  </category>
  <category>
   <name>O.SB.4</name>
   <description>O.SB.4 : Min. space from salicide block to contact.</description>
   <categories>
   </categories>
  </category>
  <category>
   <name>O.SB.5b_3.3V</name>
   <description>O.SB.5b_3.3V : Min. space from salicide block to unrelated Poly2 on COMP. : 0.1µm</description>
   <categories>
   </categories>
  </category>
  <category>
   <name>O.SB.9</name>
   <description>O.SB.9 : Min. salicide block extension beyond unsalicided Poly2. : 0.1µm</description>
   <categories>
   </categories>
  </category>
  <category>
   <name>O.SB.11</name>
   <description>O.SB.11 : Min. salicide block overlap with COMP. : 0.04µm</description>
   <categories>
   </categories>
  </category>
  <category>
   <name>O.SB.13_3.3V</name>
   <description>O.SB.13_3.3V : Min. area of silicide block (um2). : 1.488µm²</description>
   <categories>
   </categories>
  </category>
  <category>
   <name>O.SB.13_5V</name>
   <description>O.SB.13_5V : Min. area of silicide block (um2). : 2µm²</description>
   <categories>
   </categories>
  </category>
  <category>
   <name>O.CO.7</name>
   <description>O.CO.7 : Min. space from COMP contact to Poly2 on COMP. : 0.13µm</description>
   <categories>
   </categories>
  </category>
  <category>
   <name>O.PL.ORT</name>
   <description>O.PL.ORT : Orientation-restricted gates must have the gate width aligned along the X-axis (poly line running horizontally) in reference to wafer notch down. : 0µm</description>
   <categories>
   </categories>
  </category>
 </categories>
 <cells>
  <cell>
   <name>caravel_18000abd</name>
   <variant/>
   <references>
   </references>
  </cell>
 </cells>
 <items>
 </items>
</report-database>