)]}'
{
  "commit": "e75eaa4e46b8865221de62acde1b9d9f7b59f7f5",
  "tree": "85df48938c4b2fef55b5bd2fff46a2f00569c808",
  "parents": [
    "7325e441f4d3763e140fbd1e36ee472bc744d266"
  ],
  "author": {
    "name": "Tim Edwards",
    "email": "tim@opencircuitdesign.com",
    "time": "Thu Mar 03 22:54:54 2022 -0500"
  },
  "committer": {
    "name": "Tim Edwards",
    "email": "tim@opencircuitdesign.com",
    "time": "Thu Mar 03 22:54:54 2022 -0500"
  },
  "message": "Modifed the technology LEF-fixing script to add in via resistances\nand fix the one incorrect layer resistance.  Created a new script\nto generate minimum and maximum corner versions of the nominal\ntechnology LEF file.  Fixed swapped area vs. perimeter capacitances\nfor metal5 in magic.  Updated the Makefile and the openlane config\nscript to work with the modified names for the technology LEF and\nthe OpenRCX information files.\n",
  "tree_diff": [
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