diff --git a/common/pdk.prm b/common/pdk.prm
new file mode 100644
index 0000000..719eb74
--- /dev/null
+++ b/common/pdk.prm
@@ -0,0 +1,26 @@
+; TODO: make changes to this file for TECHNAME?
+; configuration file for TECHNAME (left same as osu035, 0.35um process)
+; Note that these values are totally bogus!
+;
+
+lambda  0.01    ; length scaling, microns (1 lambda = 1 centimicron)
+
+capga   .0115 ; gate capacitance, pF/micron^2
+
+capda 0.0012
+capdp 0.0013
+cappda 0.00260
+cappdp 0.00090
+
+lowthresh  0.5  ; logic low threshold as a normalized voltage
+highthresh 0.5  ; logic high threshold as a normalized voltage
+
+cntpullup 0     ; irrelevant, cmos technology; no depletion transistors
+diffperim 0     ; don't include diffusion perimeters for sidewall cap.
+subparea 0      ; poly over transistor won't count as part pf bulk-poly cap.
+diffext  0      ; diffusion extension for each transistor
+
+resistance n-channel dynamic-low    2     0.4   1844.70
+resistance p-channel dynamic-high   6.2   0.4   1489.10
+resistance n-channel static         2     0.4   2203.94
+resistance p-channel static         6.2   0.4   1693.37