)]}'
{
  "commit": "89d3ef1161fb81dc835fc8e1bd2d8bd7eff7670b",
  "tree": "20a8fe8267d9eae04e3ec40dcc6f18fcf1c7bc3a",
  "parents": [
    "2344182ded373376d94dad4f28d2141e294a1b56"
  ],
  "author": {
    "name": "Tim Edwards",
    "email": "tim@opencircuitdesign.com",
    "time": "Sat Aug 19 21:51:34 2023 -0400"
  },
  "committer": {
    "name": "Tim Edwards",
    "email": "tim@opencircuitdesign.com",
    "time": "Sat Aug 19 21:51:34 2023 -0400"
  },
  "message": "Corrected the SBLK-to-poly-contact spacing rule in the magic\ndevice generator script from 0.335um to 0.33um.  The original value\ndid not account for the difference between the drawn contact size\nin magic and the size of the cut layer.  The error resulted in poly\nresistors with contacts 0.005um too far from the resistor, causing\na DRC violation.\n",
  "tree_diff": [
    {
      "type": "modify",
      "old_id": "597894d18825b4a4de4e470faf71ebd7d95e2633",
      "old_mode": 33188,
      "old_path": "VERSION",
      "new_id": "58cd902a553211f886cd30f7a8938da9c31c36e4",
      "new_mode": 33188,
      "new_path": "VERSION"
    },
    {
      "type": "modify",
      "old_id": "34adcfccfd50b88d2c7fe9b9ab92119012ef2f81",
      "old_mode": 33188,
      "old_path": "gf180mcu/magic/gf180mcu.tcl",
      "new_id": "d9058c0a099855421ddda8c89427eda9e7246e62",
      "new_mode": 33188,
      "new_path": "gf180mcu/magic/gf180mcu.tcl"
    }
  ]
}