Initial commit of public repository open_pdks.
diff --git a/common/pdk.prm b/common/pdk.prm
new file mode 100644
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+; TODO: make changes to this file for TECHNAME?
+; configuration file for TECHNAME (left same as osu035, 0.35um process)
+; Note that these values are totally bogus!
+;
+
+lambda 0.01 ; length scaling, microns (1 lambda = 1 centimicron)
+
+capga .0115 ; gate capacitance, pF/micron^2
+
+capda 0.0012
+capdp 0.0013
+cappda 0.00260
+cappdp 0.00090
+
+lowthresh 0.5 ; logic low threshold as a normalized voltage
+highthresh 0.5 ; logic high threshold as a normalized voltage
+
+cntpullup 0 ; irrelevant, cmos technology; no depletion transistors
+diffperim 0 ; don't include diffusion perimeters for sidewall cap.
+subparea 0 ; poly over transistor won't count as part pf bulk-poly cap.
+diffext 0 ; diffusion extension for each transistor
+
+resistance n-channel dynamic-low 2 0.4 1844.70
+resistance p-channel dynamic-high 6.2 0.4 1489.10
+resistance n-channel static 2 0.4 2203.94
+resistance p-channel static 6.2 0.4 1693.37
