Name,Description,Flags,Value,Unit
(m4.-),"| Algorithm should flag errors, for met4, if ANY of the following is true:
| An entire 700x700 window is covered by cmm4 waffleDrop, and metX PD < 70% for same window.
| 80-100% of 700x700 window is covered by cmm4 waffleDrop, and metX PD < 65% for same window.
| 60-80% of 700x700 window is covered by cmm4 waffleDrop, and metX PD < 60% for same window.
| 50-60% of 700x700 window is covered by cmm4 waffleDrop, and metX PD < 50% for same window.
| 40-50% of 700x700 window is covered by cmm4 waffleDrop, and metX PD < 40% for same window.
| 30-40% of 700x700 window is covered by cmm4 waffleDrop, and metX PD < 30% for same window.
| Exclude cells whose area is below 40Kum2. Required for IP, Recommended for Chip-level.",RC,,
(m4.1),Min width of met4,,0.300,µm
(m4.2),Min spacing between two met4,,0.300,µm
(m4.3),via3 must  be enclosed by met4 by atleast,AL,0.065,µm
(m4.4),Min area of met4 (rule exempted for probe pads which are exactly 1.42um by 1.42um),,N/A,N/A
(m4.4a),Min area of met4,,0.240,µm²
(m4.5a),Min. spacing of features attached to or extending from huge_met4 for a distance of up to  0.400 µm to metal4 (rule not checked over non-huge met4 features),,0.400,µm
(m4.5b),Min. spacing of huge_met4 to metal4 excluding features checked by m4.5a,,0.400,µm
(m4.7),Min area of meta4 holes,CU,0.200,µm²
(m4.pd.1),Min MM4_oxide_Pattern_density,RR,0.7,\-
(m4.pd.2a),Rule m4.pd.1 has to be checked by dividing the chip into square regions of width and length equal to …,A,700,µm
(m4.pd.2b),Rule m4.pd.1 has to be checked by dividing the chip into steps of …,A,70,
(m4.11),Max width of metal4,CU,10.000,µm
(m4.12),Add slots and remove vias and contacts if wider than…..,CU,10.000,
(m4.13),Max pattern density (PD) of metal4; met4 overlapping pdm areas are excluded from the check,CU,0.77,\-
(m4.14),Met4 PD window size,CU,50.000,µm
(m4.14a),Met4 PD window step,CU,25.000,µm
(m4.15),Via3 must be enclosed by met4 by at least…,CU,0.060,µm
(m4.16),Min enclosure of pad by met4,CU,0.850,µm