Name,Description,Flags,Value
(m2.-),"Algorithm should flag errors, for met2, if ANY of the following is true:\nAn entire 700x700 window is covered by cmm2 waffleDrop, and metX PD < 70% for same window.\n80-100% of 700x700 window is covered by cmm2 waffleDrop, and metX PD < 65% for same window.\n60-80% of 700x700 window is covered by cmm2 waffleDrop, and metX PD < 60% for same window.\n50-60% of 700x700 window is covered by cmm2 waffleDrop, and metX PD < 50% for same window.\n40-50% of 700x700 window is covered by cmm2 waffleDrop, and metX PD < 40% for same window.\n30-40% of 700x700 window is covered by cmm2 waffleDrop, and metX PD < 30% for same window.\nExclude cells whose area is below 40Kum2. Required for IP, Recommended for Chip-level.",RC,
(m2.1),Width of metal 2,,0.140
(m2.2),Spacing of metal 2 to metal 2,,0.140
(m2.3a),Min. spacing of features attached to or extending from huge_met2 for a distance of up to  0.280 um to metal2 (rule not checked over non-huge met2 features),,0.280
(m2.3b),Min. spacing of huge_met2 to metal2 excluding features checked by m2.3a,,0.280
(m2.3c),"Min spacing between floating_met2 with AR_met2_A >= 0.05 and AR_met2_B =< 0.032, outside areaid:sc must be greater than",RR,0.145
(m2.4),Via must be enclosed by Met2 by at least …,P AL,0.055
(m2.5),Via must be enclosed by Met2 on one of two adjacent sides by at least …,AL,0.085
(m2.6),Min metal2 area [um2],,0.0676
(m2.7),Min area of metal2 holes [um2],,0.140
(m2.pd.1),Min MM2_oxide_Pattern_density,RR,0.7
(m2.pd.2a),Rule m2.pd.1 has to be checked by dividing the chip into square regions of width and length equal to …,A,700
(m2.pd.2b),Rule m2.pd.1 has to be checked by dividing the chip into steps of …,A,70
(m2.11),Max width of metal2,CU,4.000
(m2.12),Add slots and remove vias and contacts if met2 wider than…..,CU,3.200
(m2.13),Max pattern density (PD) of metal2,CU,0.77
(m2.14),Met2 PD window size,CU,50.000
(m2.14a),Met2 PD window step,CU,25.000
(m2.15),Via must be enclosed by met2 by at least…,CU,0.040